Optimization of structural and optical properties of sputter deposited TiO2 thin films by controlling deposition parameters

Abstract

Titanium oxide (TiO2) thin films have been deposited onto highly cleaned soda lime glass substrates by DC magnetron reactive sputtering system. The Ti target with purity 99.99% is sputtered by argon gas in the sputtering chamber. Oxygen gas with purity 99.99% is introduced during the deposition process into the sputtering chamber as reactive gas for the synthesis of titanium oxide. Structural and optical properties of TiO2 thin films have been characterized by X-ray diffraction (XRD), Raman spectroscopy and UV-Vis. spectroscopy. The effect of substrate temperature and sputtering power on the optical properties of TiO2 thin films has been studied. The XRD and Raman spectroscopy of as-deposited films are used to study the structural properties of TiO2 as a function of substrate temperature and sputtered power. The structural studies show the crystalline nature of TiO2 thin films. The narrowing of energy band gap of sputtered deposited TiO2thin films was studied using UV-Vis. spectroscopy.